Oxidation Treatment - 企業ランキング(全19社)
更新日： 集計期間:Sep 24, 2025〜Oct 21, 2025
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企業情報を表示
| 会社名 | 代表製品 | ||
|---|---|---|---|
| 製品画像・製品名・価格帯 | 概要 | 用途/実績例 | |
| 【Causes of Particle Generation】 ■ Cracks occur due to thermal effects from plasma ■ Corrosion progresses ■ Particles are generated → Reducti... | ■ Semiconductor manufacturing equipment, etc. *For more details, please refer to the PDF document or feel free to contact us. | ||
| 【Characteristics of Yagimaito Processing】 ■ A hydrated oxide layer is formed inside the fine pores and in the upper layer of 1μm thickness. ... | ■ Semiconductor manufacturing equipment *For more details, please refer to the PDF document or feel free to contact us. | ||
Kawamaito processing
Other |
For more details, please refer to the related links or feel free to contact us. | For more details, please refer to the related links or feel free to contact us. | |
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中国電化工業
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- 代表製品
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Semiconductor Kunimite Processing
- 概要
- 【Causes of Particle Generation】 ■ Cracks occur due to thermal effects from plasma ■ Corrosion progresses ■ Particles are generated → Reducti...
- 用途/実績例
- ■ Semiconductor manufacturing equipment, etc. *For more details, please refer to the PDF document or feel free to contact us.
Anodized film thickness of 1μm! Yagimite processing for semiconductor manufacturing equipment.
- 概要
- 【Characteristics of Yagimaito Processing】 ■ A hydrated oxide layer is formed inside the fine pores and in the upper layer of 1μm thickness. ...
- 用途/実績例
- ■ Semiconductor manufacturing equipment *For more details, please refer to the PDF document or feel free to contact us.
Kawamaito processing
- 概要
- For more details, please refer to the related links or feel free to contact us.
- 用途/実績例
- For more details, please refer to the related links or feel free to contact us.
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中国電化工業
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